Many demanding optics applications are steadily increasing performance goals for imaging, focusing and collimating systems. Microlithography and compact disk lens designs are among those that challenge optical designers to continually stretch the limits of resolution. Optical designs that use lenses with high numerical apertures (NA) offer several advantages for these applications but require that designers and manufacturers overcome some substantial challenges. Creating these high-performance systems requires ever more sophisticated design and analysis tools to aid in overcoming the inherent difficulties in producing high-quality, high-NA optics.