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Alluxa - Optical Coatings LB 8/23

Spectrophotometry Takes Measure of Deep-UV Lithography

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As lithography's optical components evolve to the next generation, so will the spectrophotometric methods used to analyze them.

Andrew Hind

High-performance deep-UV spectrophotometry played a vital role in the research and development of 193-nm lithography. Pushed further, it will do the same for 157-nm lithography by providing optical analysis of the projection lenses, illumination optics and photomasks being developed. Hence, demand for high-performance deep-UV spectrophotometers is beginning to increase. Based upon trends witnessed over the past 20 years, it is likely that 64-Gb DRAMS with 70-nm features will be in production by 2009. But development tools will be required much earlier. Before chip manufacturers can...Read full article

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    Published: December 2001
    deep-UV spectrophotometryFeaturesindustrial

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