Imec and ZEISS Semiconductor Manufacturing Technology are deepening their collaboration to advance the NanoIC pilot line at imec with state-of-the-art semiconductor technology and manufacturing expertise for sub-2nm R&D. The institute and company have agreed to extend the existing partnership, in place since 2019, until 2029. The pair have been collaborators on various projects since 1997. An agreement formalizes the partnership between imec and ZEISS through 2029. The collaborators will advance next generation semiconductor manufacturing technologies, working via the NanoIC pilot line. Courtesy of imec. The signed agreement reaffirms joint efforts to advance technologies such as high numerical aperture extreme UV lithography. In addition to supporting imec through participation in research projects to advance manufacturing, process, and measurement technologies for semiconductor manufacturing, ZEISS will provide lithography optics of various product generations for imec's pilot line.