Crystal IS Inc., a Green Island, N.Y.-based manufacturer of ultraviolet LEDs (UV-LEDs) based on aluminum nitride (AlN) substrate technology, announced it will receive an $800,000 appropriation from the US Department of Defense (DoD) to advance development of large AlN crystals for effective deep ultraviolet (DUV) sources. Crystal IS will partner on the project with the Army Research Laboratory in Adelphi, Md. and the Electro-Optics Center at Pennsylvania State University. The program will exploit the recent development of large single-crystal AlN substrates into robust semiconductor sources of DUV light as well as other high power, high temperature applications of importance to the military. The primary applications of UV-LEDs are as long-lasting, energy efficient, water and air disinfection devices. Crystal IS is developing its deep UV-LEDs at 265 nm, the peak germicidal wavelength, the company said.