CORNING, N.Y., Oct. 11 -- Corning Inc. has received a U.S. patent for a calcium fluoride (CaF2) lens blank that supports the advancement of CaF2 materials for the 193 nm and 157 nm microlithography systems. CaF2 represents the next-generation optical material for semiconductor manufacturing applications, the company said. "The production of CaF2 lens blanks is notoriously difficult," said Michael Pell, senior scientist at Corning’s Fontainebleau Research Center in Avon, France. "Growing the crystals is an extremely slow and challenging process -- the smallest impurities can result in a...Read full articleRelated content from Photonics MediaArticlesOptical Imaging Circuit Bridges Timescales in High-Speed PhotographyUltrafast optical imaging is typically measured in picoseconds, whereas high-speed electronic cameras image at the millisecond and microsecond timescale. 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