OPTICAL LITHOGRAPHY
Oct 1, 2006 — Part of the SPIE Field Guide series, the 134-page Field Guide to Optical Lithography provides an overview of the process, including substrate preparation, photoresist spin coating and postapply and postexposure bake. The spiral-bound volume’s section on image formation includes diffraction, Maxwell’s equations, Fourier optics, and spatial coherence and oblique illumination. It provides discussions on imaging into a photoresist, which encompass standing waves, Fresnel reflectivity, swing curves,...