Teledyne DALSA, ASML to Collaborate on Semiconductor Manufacture
THOUSAND OAKS, Calif., April 12, 2018 — High technology developer Teledyne DALSA Inc., in partnership with photolithography systems supplier ASML Holding NV, will produce pellicle membranes for use in extreme ultraviolet (EUV) lithography-based semiconductor fabrication. ASML has designed the EUV lithography platform as an extendable platform that will enable the continued progress in microchip manufacturing, delivering chip-device cost reductions, power savings, and performance improvements well into the next