MICROLITHOGRAPHY STAGE
Novanta IMSRequest Info
The SF-100 rotational substrate stage from Intelligent Micro Patterning LLC enables precise maskless patterning on cylindrical surfaces. An add-on to the company’s maskless micropatterning system, the stage provides highly controllable and repeatable patterning of cylindrical substrates using standard photolithographical materials and techniques. Pattern features as small as 10 μm are possible with the device, which also offers low backlash, high-output torque, Windows-based operating software, and easily and quickly modifiable mounting positions.
https://novantaims.com
/Buyers_Guide/Novanta_IMS/c16474
Published: January 2007
REQUEST INFO ABOUT THIS PRODUCT
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:
Message:
When you click "Send Request", we will record and send your personal contact information to Novanta IMS by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our
Privacy Policy and
Terms and Conditions of Use.
Register or login to auto-populate this form:
Login
Register
* Required