Batch Reactor
Aixtron SERequest Info
The G10-AsP system from Aixtron SE enables robust, high-volume production for microLED and laser applications.
With an automated process, the arsenide-phosphide system meets the complex requirements of producing indium phosphide and vertical cavity surface emitting lasers in high volumes. The 200-mm batch reactor comes with in-situ cleaning and an automated cassette-to-cassette wafer loading. The front-end can be equipped with standard mechanical interface pods to further minimize the exposure of the epitaxial wafers to the room environment. The platform is based on planetary reactor technology that combines the multi-wafer batch reactor concept with single-wafer rotation for wafer uniformity.
https://www.aixtron.com
/Buyers_Guide/Aixtron_SE/c484
Published: February 2023
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