Aplanatic Objective
AdlOptica GmbHRequest Info
The aplanoXX_NA0.8 objective for diffraction limited focusing from AdlOptica GmbH features a numerical aperture of 0.8 inside transparent materials with compensation for spherical aberration at depths ranging from 0 to 4 mm.
Its high optical resistance to radiation of high power ultra-short pulse lasers with wavelengths of 515, 800, and 1030 nm, along with its optical design, are optimal for microprocessing fused silica, sapphire, glass, silicon carbide, silicon, and other materials in applications such as LED manufacturing, nanostructuring for optical data storage, and 3D micro- and nanofabrication. The aberration-free, high numerical aperture focusing is also important in various types of microscopy.
The objectives are equipped with a replaceable protective window that prevents damage of optical elements from chips and dust ejected during material processing. The aplanatic optical design guarantees low sensitivity to misalignments, which facilitates and simplifies the integration of aplanoXX objectives in existing equipment and research setups.
http://www.adloptica.com
/Buyers_Guide/AdlOptica_GmbH/c19509
Published: June 2020
REQUEST INFO ABOUT THIS PRODUCT
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:
Message:
When you click "Send Request", we will record and send your personal contact information to AdlOptica GmbH by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our
Privacy Policy and
Terms and Conditions of Use.
Register or login to auto-populate this form:
Login
Register
* Required