Vistec, MIET to Collaborate

Vistec Electron Beam GmbH of Jena, Germany, has announced its entrance into a joint electron beam lithography project with Moscow Institute of Electronic Technology (MIET). The two will collaborate on a photomask manufacturing project that began recently in Russia. The electron beam lithography provider will supply the institute with a 50-kV variable-shaped beam system, which is equipped with fully automated substrate handling and can expose different substrate types and sizes. MIET will provide the masks to the semiconductor industry and research institutes in Russia for a variety of applications.

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Published: December 2009

Glossary

lithography: Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
nano: An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
photonics: The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...

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