Two centers for nanoelectronics research and development -- the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in Albany, N.Y., and IMEC in Leuven, Belgium -- have announced plans to jointly perform extreme ultraviolet lithography (EUVL) experiments in order to accelerate the introduction of EUVL into manufacturing. The first set of collaborative experiments will be carried out at CNSE’s Albany NanoTech Complex, with future studies to be conducted at CNSE and IMEC. The collaboration will also involve scientists from IBM and ASML, which has built a full-field EUVL R&D alpha demo tool. The majority of activities will focus on the advanced imaging capabilities of the EUVL system, and effort will be devoted to the understanding of new materials and various aspects of equipment technology, CNSE said in a statement. The work is expected to further advance learning of EUVL technology and the associated infrastructure required to support it. "Ultimately, this alliance is intended to effectively demonstrate the practical feasibility of EUVL and build confidence in the technology for the 32-nm half-pitch device node and below," CNSE said. For more information, visit: cnse.albany.edu