RICHARDSON, Texas, March 11 -- Optical Switch Corp. (OSC) said it has installed its Model PC2 high-resolution lithography system at JDS Uniphase, Eindhoven, the Netherlands. The interference lithography-based Model PC2, developed by OSC's Microphotonics Group in Bedford, Mass., generates 190 nm- to 260 nm-period grating structures with a fully automated, high-throughput patterning tool and process. 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