FEI Co. of Hillsboro, Ore., a provider of atomic-scale imaging and analysis systems, has joined the Advanced Metrology Development Program at the College of Nanoscale Science and Engineering at the University at Albany-State University of New York. The program is run by Sematech, a global consortium of chipmakers. The company will collaborate with metrology experts to create tools for high-resolution imaging and compositional data at the nanometer scale for use in defect analysis.