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Loopstra, Banine Named Finalists for EPO Inventor Award for Advances in EUV Lithography

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OBERKOCHEN, Germany, May 28, 2018 — Zeiss’ Erik Loopstra and ASML’s Vadim Banine have been nominated by the European Patent Office (EPO) as finalists for the 2018 European Inventor Award in the "industry" category for their inventions in the field of extreme UV (EUV) lithography. Vadim Banine (left), director of research at ASML, and systems engineer Erik Loopstra in front of a model of an ASML extreme UV lithography system. Courtesy of Zeiss. Loopstra and Banine’s key invention has made it possible to create geometric patterns on silicon wafers – the basis of the microchip – at a...Read full article

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    Published: May 2018
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    ZeisErik LoopstraASMLVadim Banine2018 European Inventor AwardlithographyindustrialawardsBusiness

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