SAN DIEGO, Oct. 1 -- JMAR Technologies Inc., a developer of collimated laser plasma lithography systems, announced it received $7.7 million in funding to demonstrate its integrated NanoPulsar semiconductor lithography stepper system and its evaluation by GaAs end users. This program is sponsored by the Defense Advanced Research Projects Agency (DARPA). The new funding is part of an incremental $34.5 million award JMAR received from the U.S. Army in February. 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