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Infineon, Canon Launch Lithography Project

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MUNICH, June 14 -- Infineon Technologies AG and Canon Inc. are launching a joint research project for the development of photolithography systems utilizing 157-nm technology via F2 laser illumination.     The joint effort is expected to accelerate the development of 157 nm lithography systems, and the subsequent introduction of these systems in the manufacturing process of semiconductor devices. Infineon plans to introduce 157-nm lithography for the production of memory and logic products at its advanced production sites.     Infineon will join in efforts to speed up the realization of...Read full article

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    Published: June 2001
    industrialNews & Features

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