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EUV Light Source Could Meet Chip Makers’ Future Lithography Needs

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BERLIN, July 2, 2024 — Scientists from Helmholtz-Zentrum Berlin (HZB), Tsinghua University, and Germany’s national metrology institute Physikalisch-Technische Bundesanstalt (PTB), are building the foundation for a future source for coherent UV radiation, known as steady-state microbunching (SSMB). According to the researchers, SSMB could provide a way to generate coherent synchrotron radiation at an electron storage ring in order to supply kilowatt (kW)-level average power radiation in the extreme UV (EUV) regime. As semiconductor manufacturers ask for shorter wavelengths to etch structures of...Read full article

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    Published: July 2024
    Glossary
    metrology
    Metrology is the science and practice of measurement. It encompasses the theoretical and practical aspects of measurement, including the development of measurement standards, techniques, and instruments, as well as the application of measurement principles in various fields. The primary objectives of metrology are to ensure accuracy, reliability, and consistency in measurements and to establish traceability to recognized standards. Metrology plays a crucial role in science, industry,...
    synchrotron
    A synchrotron is a type of particle accelerator that uses magnetic fields to steer charged particles, typically electrons or positrons, in a closed, circular or elliptical path. The name synchrotron refers to the synchronization of the accelerating electric field with the increasing particle velocity as they move in a circular path. Synchrotrons are powerful tools used in various scientific and industrial applications, particularly in the generation of intense beams of synchrotron radiation. ...
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    Research & TechnologyeducationEuropeAsia-PacificHelmholtz-Zentrum Berlin)Tsinghua UniversityPhysical-Technical Federal InstituteLasersLight SourcesMaterialsspectroscopysemiconductorsindustrialenergymetrologyultraviolet lightextreme ultraviolet lightcoherent lightsteady-state microbunchingsynchrotronlithography

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