Machine and systems engineering company Oerlikon Systems of St. Petersburg, Fla., announced that the Cornell University Nanoscale Science and Technology Facility (CNF) in Ithaca, N.Y., has purchased its Versaline deep silicon dry-etching system to give the CNF processing capability for MEMS (microelectromechanical systems) device fabrication and other nanoscale science and technology projects. The CNF is a national user facility that provides resources as part of the National Nanofabrication Infrastructure Network (NNIN). Over 700 researchers per year use the CNF to build atomic- to micron-length structures, devices and systems for applications in the physical sciences, engineering and life sciences, and the dry etching of silicon is one of the critical processes for research in these areas. The tool is scheduled to arrive at CNF later this year.