TABY, Sweden, Dec. 19 -- Micronic Laser Systems, manufacturer of laser pattern-generation equipment to semiconductor and display industries, announced its sale of an Omega6600 laser pattern generator to a major commercial photomask manufacturer in Asia. It said delivery will be this year.
The Omega6600 is a volume production tool capable of writing photomasks for semiconductors with 130 nm design rules. Working with high-end i-line resists, the tool includes functions such as dual mode, flexible grid, phase shift mask alignment and CD correction.