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Excelitas PCO GmbH - PCO.Edge 11-24 BIO LB

Kurt J. Lesker Co. Purchases Ion Sources

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The Kurt J. Lesker Co. of Clairton, Pa., has acquired the ion source family of Anatech Ltd., based in Denver, N.C., to complement its range of deposition products. Along with power supplies and accessories, the purchase includes 3-, 5- and 10-cm filamentless sources that have applications in sample cleaning, ion-assisted deposition, mild etching and surface modification. The Lesker/Anatech patented ion sources use no thermionic emitter to generate a plasma, either filament or tip, and are inert and reactive compatible. Lesker has moved design and manufacturing processes related to the acquisition to its headquarters.
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Published: July 2004
Glossary
ion-assisted deposition
A technique for improving the structure density of thin-film coatings by bombarding the growing film with accelerated ions of oxygen and argon. The kinetic energy then dissipates in the film, causing the condensed molecules to rearrange at greater density.
Anatech Ltd.Businesscleaningdeposition productsindustrialion-assisted depositionKurt J. Lesker Co.light speedmild etchingsurface modification

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