Search
Menu
Optimax Systems, Inc. - Ultrafast Coatings 2024 LB

A New Spectral Analysis System Designed to Measure High-Performance Thin-Film Optical Filters

Facebook X LinkedIn Email
Author: Alannah Johansen, Amber Czajkowski, Niels Cooper, Mike Scobey, Peter Egerton, and Rance Fortenberry, PhD
Saturday, July 1, 2017
Alluxa

The HELIX Spectral Analysis System was designed to address the limitations of most commercially available spectrophotometers when measuring high-performance thin-film optical filters. The system’s capabilities are four-fold: it is able to track filter edges to OD7 (-70 dB), evaluate blocking to OD9 (-90 dB), resolve edges as steep as 0.4% relative to edge wavelength from 90% transmission to OD7, and resolve passbands that are as narrow as 0.1 nm at full width half maximum (FWHM).

Download White Paper
File: HELIX_A_New_Spectral_Analysis_System.pdf (992.76 KB)
To download this white paper, please complete the *required fields before clicking the "Download" button.
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:




When you click "Download", you agree that your personal contact information may be shared with Alluxa and they may contact you about their products and services in the future. You also agree that Photonics Media may contact you with information related to this request, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.

Register or login to auto-populate this form:
Login Register
* Required
CoatingsOpticsTest & MeasurementFiltersRamanlidarinterference filtersnotchspectrophotometermonochromatormetrology
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.