OSI Optoelectronics - Custom Solutions LB 5/23

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The ILC Laser: Enabling Breakthrough Research in EUV Lithography and Plasma Diagnostics

Friday, September 5, 2025
Power Technology Inc.

This whitepaper synthesizes peer-reviewed research spanning materials science, fluid dynamics, and photonics to demonstrate how the ILC laser’s unique combination of 30-ns pulse durations, 850 nm wavelength stability, and µs-scale timing precision has become indispensable for unraveling the complex physics underlying EUV light generation. From stroboscopic visualization of tin droplet fragmentation to plasma plume characterization, the ILC laser has consistently provided the temporal and spatial resolution required to advance both fundamental science and industrial applications.

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The ILC Laser: Enabling Breakthrough Research in EUV Lithography and Plasma Diagnostics

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File: 2025_9_5_ILC_Pulsed_Diode_Laser_Module_Whitepaper_Technical_Literature_Review.pdf (983.29 KB)
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