Storex Tech Study Clears Optical Lithography Hurdle
WILMINGTON, Del., and BUCHAREST, Romania, Feb. 13, 2014 — Storex Technologies Inc. has developed an optical lithography technique with a resolution of 1 nm half-pitch lines, clearing a major hurdle in this field. Many attempts have been made to break the diffraction limit, which Storex researchers said has long been a problem in optical lithography. In its study, the company demonstrated that quantum optical lithography can attain 1-nm resolution by optical means using new materials, including fluorescent photosensitive glass ceramics and QMC-5,