Photomask Repair Equipment
Park Systems Corp.Request Info
SEOUL, South Korea, Nov. 18, 2022 — 
Park NX-Mask photomask repair equipment from Park Systems Corp. supports dual pods for handling extreme UV masks on inline production.
The all-in-one solution provides auto defect review to repair of defects and verification of the repair, accelerating throughput at a high efficacy. It removes defects and foreign particles with nm accuracy and angstrom level precision of the edge placement. It does not disturb the reflective surface pattern or spurious depositions including stains and implanted elements.
https://www.parksystems.com
/Buyers_Guide/Park_Systems_Corp/c18079
Published: November 2022
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