NESSY 1900
Buhler Inc., Business Area Leybold OpticsRequest Info
Advanced sputtering system for x-ray
mirrors for EUV lithography.
• DC or DC pulsed sputtering coating
technology.
• Mo, Si, Cr, Sc, and different materials for
diffusion-barrier layers and capping layers.
• Sputter source: Up to 6 PK; 600 × 125 mm.
• Base pressure: 9 × 10–9 mbar.
• Planetary-drive speed: 0–5 rpm.
• Rotation-table speed: 0–500 rpm.
https://www.buhlergroup.com
/Buyers_Guide/Buhler_Inc_Business_Area_Leybold_Optics/c8437
Published: July 2022
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