Lithography System
Nikon Corp., Digital Solutions Business UnitRequest Info
The NSR-S625E argon fluoride (ArF) immersion scanner from Nikon Corp. is optimized for middle critical layers.
The lithography system provides enhanced throughput and operational stability for the efficient production of semiconductor devices. It features a resolution of 38 nm, a numerical aperture of 1.35, and a 193-nm wavelength excimer laser light source.
https://www.nikon.com/products/components
/Buyers_Guide/Nikon_Corp_Digital_Solutions_Business_Unit/c10300
Published: May 2023
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