Electron Beam Metrology System

Applied MaterialsRequest Info

Applied Materials’ VeritySEM^®10 CD-SEM metrology system is designed to precisely measure the critical dimensions of semiconductor device features patterned with EUV and emerging High-NA EUV lithography. The system architecture enables low landing energy at 2× better resolution compared to conventional CD-SEMs. It also provides a 30% faster scan rate to further reduce interaction with the photoresist and increase throughput. The system’s resolution and scan rate provide improved control of EUV and High-NA EUV lithography and etch processes to help chipmakers accelerate process development and maximize yield in high-volume manufacturing. The system uses sub-nanometer eBeam resolution to capture between 13 and 36 precise CD measurements across the wafer.

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Published: March 2023

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