Atomic Layer Deposition System
Oxford InstrumentsRequest Info
The PlasmaPro ASP high-rate atomic layer deposition (ALD) research system from Oxford Instruments is designed for quantum technology and advanced R&D.
The system features a patented remote plasma source design, optimized chamber geometry, and wafer stage bias for ion energy control, resulting in a fast atomic layer deposition rate, low resistivity, and high critical temperature superconducting nitride films. Its initial application focus is quantum technology.
https://www.oxinst.com
/Buyers_Guide/Oxford_Instruments/c853
Published: July 2023
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