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Excelitas Technologies Corp. - X-Cite Vitae LB 11/24

Zeiss Invests in Nanoscribe

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OBERKOCHEN, Germany, Oct. 3, 2008 -- Oberkochen-based optical company Carl Zeiss announced it has acquired a 40 percent stake in startup Nanoscribe GmbH, a developer of laser direct-write tools for 3-D nanostructuring. Specific terms of the deal were not disclosed.

Nanoscribe, based in Karlsruhe, Germany, was formed in December 2007 from the work group of Dr. Martin Wegener at the Institute for Applied Physics at the University of Karlsruhe and the Karlsruhe Research Center.

“Carl Zeiss is going down a new road by supporting the young researchers and entrepreneurs at an early stage in the founding of the company not only financially, but also with our knowledge and corresponding technology,” said Dr. Michael Kaschke, a member of the Carl Zeiss executive board. At the same time, this ensures the company’s involvement in a pioneering technology.

Nanoscribe develops and produces compact rapid prototyping laser lithography systems for the manufacture of 3-D micro- and nanostructures in photoresist. The emerging technology of 3-D laser lithography has applications in micro- and nanophotonics, the life sciences, biotechnology and in microfluidics.

"Nanoscribe has the potential to open up new fields of application in optical technologies. The partnership with Carl Zeiss is a milestone along the way," said Martin Hermatschweiler, one of the founders and executive directors of the startup.

Carl Zeiss has worked with the company since 2007, delivering its first system at the end of June. Professor Martin Wegener, one of the founders and scientific consultants of the startup, received the 2006 Carl Zeiss Research Award.

For more information, visit: www.nanoscribe.de or www.zeiss.com
Excelitas PCO GmbH - PCO.Edge 11-24 BIO MR

Published: October 2008
Glossary
lithography
Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
microfluidics
Microfluidics is a multidisciplinary field that involves the manipulation and control of very small fluid volumes, typically in the microliter (10-6 liters) to picoliter (10-12 liters) range, within channels or devices with dimensions on the microscale. It integrates principles from physics, chemistry, engineering, and biotechnology to design and fabricate systems that handle and analyze fluids at the micro level. Key features and aspects of microfluidics include: Miniaturization:...
nano
An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
optical
Pertaining to optics and the phenomena of light.
photonics
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
photoresist
Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a crucial component in the patterning of semiconductor wafers during the manufacturing process. The primary function of photoresist is to undergo a chemical or physical change when exposed to light, making it selectively soluble or insoluble in a subsequent development step. The general...
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