SPIE has announced the launch of a new Gold Open Access journal, the Journal of Optical Microsystems (JOM), which starting in January will publish cutting-edge research of optical and photonic microsystems. Hans Zappe, co-editor-in-chief of SPIE’s Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), will serve as editor-in-chief of the new journal. Concurrently, JM3 will be renamed the Journal of Micro/Nanopatterning, Materials, and Metrology and retain the familiar acronym. JM3 co-editor-in-chief Harry J. Levinson will lead that journal, which will focus on lithographic technologies. Since 2002, JM3 has published papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonic industries. Co-editors-in-chief Hans Zappe and Harry J. Levinson. Courtesy of SPIE. The renamed JM3 will publish peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry. Key subject areas include the science, development, and practice of lithographic, computational, etch, and integration technologies. JOM will publish research in all aspects of optical and photonic microsystems, from materials and fabrication of micro-optical and photonic components, through assembly and packaging, to systems and applications. JOM will open for submissions in May 2020, and all publication charges will be waived through 2021. “One of the challenges in the pursuit of excellence that was noted by prior editors-in-chief of the original JM3 has been its excessively wide scope, serving multiple diverse technical communities,” Levinson said. “These two journals are now ideally positioned to serve their respective communities,” Zappe said. “With a clear focus on their readerships, both academic and industrial, they will provide a very attractive publication venue for authors working in the lithography or microsystems fields.” Levinson, a consultant at HJL Lithography, is a former senior director of GLOBALFOUNDRIES’ Strategic Lithography Technology organization. He spent nearly all of his career working in the field of lithography, starting at Advanced Micro Devices. He also served for several years as the chairman of the USA Lithography Technology Working Group, which helped generate the lithography chapter of the International Technology Roadmap for Semiconductors. Levinson has published numerous articles on lithographic science and holds over 70 U.S. patents. Levinson is an SPIE fellow, has chaired the SPIE Publications Committee, and has served on the SPIE board of directors. In recognition of his contributions to SPIE, he received the Society’s 2014 Directors’ Award. Zappe is an international researcher in the areas of optical microsystems and micro-optical components and has made contributions to fluidic imaging systems, tunable lenses, and adaptive optics. He previously worked at IBM, the Fraunhofer Institute for Applied Solid State Physics, and the Centre Suisse d’Electronique et de Microtechnique before joining the Department of Microsystems Engineering at the University of Freiburg in 2000. He is a fellow of SPIE and IOP. The Journal of Optical Microsystems and the Journal of Micro/Nanopatterning, Materials, and Metrology will be published by SPIE in the SPIE Digital Library.