TABY, Sweden, Dec. 21 -- Micronic Laser Systems AB has signed an agreement in principle to expand and strengthen its cooperation with Fraunhofer Institute for Microelectronic Circuits and Systems (Fraunhofer IMS). The agreement extends by three years the development collaboration between Micronic and Fraunhofer IMS and expands Micronic's present exclusive license rights for spatial light modulator (SLM) technology for direct-write and photomask writing with inspection and measurement. The cooperation covers several SLM component generations aimed to support future semiconductor design nodes. Micronic first licensed the SLM technology, which is based on a MEMS circuit with a flat, mirror-like surface, in 1998. The agreement was expanded in 2000 to include direct-write applications.