Several techniques improve the performance of objectives used in microlithographic resist development.James E. WebbIn the never-ending quest for the optimal objective for microlithography wavelengths, engineers have worked on ways to improve the aberration and birefringence correction of 0.85-NA Newtonian objectives used in microlithographic resist development. Corning Tropel Corp. has built, tested, optimized and delivered two objectives to customers for use in Exitech microsteppers. Although the first of these objectives was designed and built with some knowledge of the effects of intrinsic birefringence in optical calcium fluoride, it was before methods to reduce its impact could be implemented....Read full articleRelated content from Photonics MediaArticlesA Quantum Leap for Sensitive Gas AnalysisFar above an oil pipeline, a drone bobs and weaves. 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