PW10: Variety at Edmund Optics

Laura S. Marshall

SAN FRANCISCO, Jan. 29, 2010 – Flexibility was a recurring theme among exhibitors at SPIE Photonics West this year, and Edmund Optics (EO) was no exception: The Barrington, N.J.-based company had a large number of new and recent products on display, including hands-on demonstrations designed to show attendees the various ways in which EO components can be combined.

Project Manager Adam Bublitz noted that Edmund has been focusing on biotech optics, investing in new asphere technology and developing hybrid and plastic aspheres for biophotonic applications.

From C-Mount components for dental imaging systems to reflective objectives that use mirrors instead of lenses, Edmund showed off its products and their wide range of uses.

EO’s TechSpec adjustable ReflX objectives are the company’s “best new product,” according to Kirsten Bjork-Jones, marketing manager. “This is a very unique product for us.” The objectives cut out chromatic aberration and material absorption problems found with standard microscope objectives, making them useful for UV or IR applications such as FTIR spectroscopy, semiconductor inspection, ellipsometry and photolithography. “Everybody services the visible,” said David Henz, product manager for anchor optics. “We’re focusing on the IR.”

Excelitas PCO GmbH - PCO.Edge 11-24 BIO MR

Recent releases, TechSpec Hard-Coated Bandpass Interference Filters also made an appearance at the show. These filters come in center wavelengths from 405 to 980 nm and offer a 10 nm bandwidth. High-precision applications for these filters include biotech, biomedical and quantitative chemical applications such as clinical chemistry, environmental testing, colorimetry, elemental and laser line separation, flame photometry, fluorescence and immunoassays, and more. Their dense coating prevents filter degradation, Henz noted.

Also available for demonstration were F-Theta Scanning Lenses, designed for Nd:YAG (1064 nm, 532 nm and 355 nm) and CO2 (10.6 µm) laser sources. Laser marking, engraving and cutting systems are some of their intended applications.

Laura S. Marshall
[email protected]

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Published: January 2010

Glossary

c-mount: A standard lens interface initially made for 16mm movie cameras and now used primarily on closed-circuit television cameras. It is a 1-in.-diameter, 32-thread-per-inch interface with a flange-to-image plane distance of 0.69 in.
chromatic aberration: Chromatic aberration is an optical phenomenon that occurs when different wavelengths (colors) of light are refracted by a lens or optical system, leading to a failure to focus all colors to the same convergence point. This results in colored fringes or halos around the edges of objects, reducing the overall image quality and sharpness. Key points about chromatic aberration include: Cause: Chromatic aberration arises because different colors of light have different refractive indices...
colorimetry: Colorimetry is the science and technology of quantitatively describing and measuring colors. It involves the precise evaluation of color attributes such as hue, saturation, and brightness, using standardized methods and instruments. Colorimetry relies on color perception models, which approximate how humans perceive color, to quantify and represent color information numerically. In practical terms, colorimetry is used in various fields such as color reproduction in displays and printing,...
ellipsometry: Ellipsometry is an optical technique used to characterize the properties of thin films and surfaces. It is based on the measurement of changes in the polarization state of light reflected or transmitted from a sample. In ellipsometry, polarized light is typically directed at an angle onto the surface of the sample. As the light interacts with the sample's surface and any thin films present, its polarization state changes. By precisely measuring these changes in polarization, ellipsometry...
flame photometry: A part of the spectrochemical analysis of a sample that deals with the excitation of that sample by flame analysis.
fluorescence: Fluorescence is a type of luminescence, which is the emission of light by a substance that has absorbed light or other electromagnetic radiation. Specifically, fluorescence involves the absorption of light at one wavelength and the subsequent re-emission of light at a longer wavelength. The emitted light occurs almost instantaneously and ceases when the excitation light source is removed. Key characteristics of fluorescence include: Excitation and emission wavelengths: Fluorescent materials...
laser marking: Laser marking is a process in which a laser beam is used to mark or engrave a surface by altering its properties or appearance. This technique is widely used for labeling, identification, and decoration of various materials, including metals, plastics, ceramics, glass, and more. Laser marking provides a permanent and high-precision method for adding information or graphics to a wide range of objects. Key features of laser marking include: Contactless process: Laser marking is a non-contact...
nd:yag laser: Nd:YAG laser refers to a solid-state laser that utilizes neodymium-doped yttrium aluminum garnet (Nd:Y3Al5O12) as the gain medium. This type of laser emits light at a wavelength of 1064 nm in the infrared region of the electromagnetic spectrum. Nd:YAG laser suppliers → Here is a breakdown of the components and operation of an Nd:YAG laser: Gain medium: The active medium of the laser is a crystal made of yttrium aluminum garnet (YAG) doped with neodymium ions (Nd3+). When...
photolithography: Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...

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