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Opto Diode Corp. - Opto Diode 10-24 LB

NSF Award for Deep UV LEDs

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COLUMBIA, S.C, Feb. 12, 2010 – Sensor Electronic Technology Inc. (SETI), announced that is has been awarded a Phase II SBIR award from the National Science Foundation (NSF) for $500,000 to further advance its Deep Ultraviolet (DUV) LEDs with novel proprietary and patent pending approach for High Quality p-cladding Layers for enhanced output power and light extraction.

This Phase II project will develop and commercialize next-generation high-power DUV LEDs in UV-B spectral range. The project aims to improve the LED efficiency and lifetime by improvements in the material quality, doping, and device design that will lead to low-cost, high power semiconductor DUV radiation sources with wall plug efficiency exceeding 59 percent and operation lifetimes greater than 5,000 hours.

Deep UV LEDs are available from SETI today at wavelengths of 240 nm to 400nm and are primarily used in medical, bio-analytical, sensing, and homeland security markets. The enhancements targeted in this project will lay the groundwork for large-scale penetration of high volume markets, such as global sanitation and disinfection.

Once operating at this level of performance, deep UV LEDs offer an environmentally friendly UV light source without the scrap and toxicity issues surrounding conventional mercury based lamps.

The NSF SBIR program’s mission is to increase the incentive and opportunity for small firms to undertake cutting edge, high risk, high quality scientific, engineering, or science and engineering education research that would have potential of high economic payoff if the projects are successful.

For more information, visit: www.s-et.com  
Hamamatsu Corp. - Mid-Infrared LED 11/24 MR

Published: February 2010
Glossary
doping
In the context of materials science and semiconductor physics, doping refers to the intentional introduction of impurities into a semiconductor material in order to alter its electrical properties. The impurities, called dopants, are atoms of different elements than those comprising the semiconductor crystal lattice. Doping is a crucial technique in semiconductor device fabrication, as it allows engineers to tailor the conductivity and other electrical characteristics of semiconductor...
bio-analyticalBusinessDeep ultraviolet LEDsdefensedevice designdisinfectiondopingglobal sanitationhomeland securityindustriallifetimelight extractionLight SourcesmedicalmercuryNational Science FoundationNSF p-cladding layersPhase II SBIRradiation sourcessemiconductorssensingSensor Electronic TechnologySensors & DetectorsSETISouth CarolinaSpectral RangeSTTRtoxicityUV LEDUV-Bwall plug efficiencyLEDs

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