TABY, Sweden, April 23 -- Micronic Laser Systems AB said Photronics Inc. has ordered a Sigma7000 series laser-pattern generator. The system will be used in the production of advanced semiconductor photomasks for the 130 nm technology node and beyond. Financial details of the order were not disclosed. The system will be shipped in the third quarter of 2002 at the latest, the company said.
The Sigma7000 series is based on Micronic's spatial light modulator technology, which uses a massive parallel patterning principle, consisting of a chip with one million individually controlled micromirrors.