Micronic Laser Systems AB of Täby, Sweden, has filed a complaint in US District Court in San Jose, Calif., claiming that Etec Systems Inc. of Hayward, Calif., has falsely accused Micronic of patent infringement. The Swedish company, which says sales of its multibeam laser pattern-generation systems in the US have been affected, is seeking damages and a declaration that Etec's patent claims are invalid.

Etec was unavailable for comment.

Micronic designs, produces and distributes high-resolution microlithography equipment for the production of photomasks. Etec manufactures and markets mask pattern generation equipment, and electron-beam and laser direct-imaging technology.