Search
Menu
Admesy BV - Built to Perform 1-25 LB

Max-IR Labs Takes Top Prize at 2025 SPIE Startup Challenge

Facebook X LinkedIn Email
SAN FRANCISCO, Jan. 29, 2025 — During a ceremony yesterday at SPIE Photonics West, Max-IR Labs was named as the winner of the $10,000 top prize at the 15th annual SPIE Startup Challenge. The company’s AquaCarbon Monitor is set to facilitate carbon credits with precise CO2 monitoring in water systems.
(From left) Jenoptik’s Ralf Kuschnereit, Max-IR Lab's Trey Daunis, and 2025 SPIE President Peter de Groot. Courtesy of SPIE.
(From left) Jenoptik’s Ralf Kuschnereit, Max-IR Lab's Trey Daunis, and 2025 SPIE President Peter de Groot. Courtesy of SPIE.

Photosynthetic B.V. and their Volumetric Micro-Lithography product, which enables the rapid production of complex 3D devices with submicron features, received $5000 for second place. OptiCardio came in third, winning $2500 with their spectroscopy-enabled device for real-time guidance to reduce the recurrence rate of ablation procedures for atrial fibrillation.

The SPIE Startup Challenge, a pitch competition held annually by SPIE, showcases new businesses, products, and technologies that address critical needs by utilizing photonics in the areas of healthcare and deep tech. This year’s seven finalists included innovations in medical applications, environmental monitoring, and manufacturing.

The 2025 SPIE Startup Challenge was supported by founding partner Jenoptik, lead sponsor Hamamatsu, and supporting sponsors Luminate and Thorlabs. The competition judges who vetted the applicants for their business models, financial cases, and competitive advantages included Jenoptik’s Marc Grahl, Hamamatsu Ventures’ Robert Warren, Edmund Optics’ Agnes Hübscher, Launch Team’s Michele Nichols, Advancing Photonic Technologies’ Christine Galib, and ams OSRAM’s Markus Arzberger.


Lumibird - You Have a Project 1-25 MR


Published: January 2025
Glossary
lithography
Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
BusinessStartup ChallengePhotonics WestSPIEMax-IR LabsphotosyntheticOpticardioBiophotonicsAmericasEuropeCO2 monitoringablationspectroscopylithographyVolumetric Micro-LithographyAquaCarbonSPIE Startup Challenge2025

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.