Vistec Lithography Inc. of Watervliet, N.Y., has announced that AMO GmbH of Aachen, Germany, a nanotechnology research service provider, has placed an order for its EBPG5200 electron beam lithography system. The instrument can generate structures less than 8 nm on varying substrates and part sizes from a few millimeters to 200 mm in diameter. The system incorporates an interactive graphical user interface for ease of use in multiuser environments.