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Teledyne DALSA - Linea HS2 11/24 LB

Intel Supports EUV Source Development

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Intel Corp.’s investment business, Intel Capital, has provided funding to Xtreme technologies GmbH to advance its development of extreme-ultraviolet sources for photolithography at its plants in Jena and Göttingen, Germany. Xtreme is a joint venture of Jenoptik AG in Jena and of Ushio Inc. in Tokyo.
Hamamatsu Corp. - Mid-Infrared LED 11/24 MR

Published: April 2006
Glossary
photolithography
Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
Businessextreme-ultraviolet sourcesindustrialIntel Corp.light speedphotolithography

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