Pulsed laser deposition creates complex oxide thin films such as high-Tc superconductors, but it works only under high oxygen pressure (up to 100 Pa). Reflection high energy electron diffraction (RHEED) can monitor the growth of thin films, but only in an ultrahigh-vacuum environment. Researchers from the University of Twente in The Netherlands have developed a monitoring system that increases deposition pressure up to 50 Pa using a two-stage differential pumping system, essentially re-creating standard pulsed laser deposition conditions.