ASML to Appoint Christophe Fouquet President and CEO

The supervisory board of ASML intends to appoint Christophe Fouquet, currently ASML’s chief business officer and member of the board of management, as the company’s next president and CEO. The appointment is subject to notification of the annual general meeting of shareholders on April 24, 2024. On the same date, ASML’s co-presidents, CEO Peter Wennink and CTO Martin van den Brink, will retire from ASML upon completion of their current terms.

Additionally, the supervisory board intends to appoint Jim Koonmen as chief customer officer, a new position in ASML’s board of management. Koonmen’s appointment is also subject to notification of the annual general meeting of shareholders.

Fouquet has been with ASML for 15 years. Koonmen joined ASML in 2007 through its acquisition of Brion, where he was general manager from 2008 until 2015. He subsequently served as CEO of Cymer and led the applications business line for five years.

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Published: December 2023

Glossary

lithography: Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
photolithography: Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
extreme ultraviolet: Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
deep ultraviolet: Deep ultraviolet (DUV or deep-UV) refers to a specific range of ultraviolet light with shorter wavelengths than those in the UV-A and UV-B regions. The exact wavelength range considered as DUV can vary, but it often includes wavelengths from around 100 to 300 nanometers. DUV light is shorter in wavelength and higher in energy than visible light. DUV light covers the spectrum from approximately 100 to 300 nanometers. This range is subdivided into different sub-bands, such as UV-C (100 to...

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