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New Metrology Techniques for Advanced Thin-Film Optical Filters

Author: Alluxa Engineering Staff
Tuesday, July 3, 2012
Alluxa

The performance of advanced thin films as demonstrated by Alluxa’s thin films are challenging even the best metrology equipment and techniques. In this paper we have described a number of simple techniques, such as reference beam attenuation, placement of apertures in the sample beam, and appropriate use of spectral slit widths and scan speeds. These techniques, combined with knowledge of the theoretical filter performance, can greatly improve the accuracy of nearly all spectrophotometer measurements of today’s most advanced thin film filters.

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