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Excimer-Laser Metrology Improves Lithography Process Control
As Moore’s law marches on, semiconductor manufacturers rely on advances in photolithography – the use of 193-nm ArF excimer lasers, for example, coupled with optical and process techniques to improve resolution and reduce patterning variations. Recent examples of such technologies include advanced reticle designs that correct for optical proximity effects, use of double- or multiple-patterning exposure methods, computational techniques that achieve source-mask optimization and free-form scanner illumination technologies. These techniques all require increasing stability and control of the excimer laser performance.
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Optics for DPSS Lasers: Finding a Balance
Building efficient diode-pumped solid-state lasers requires a careful balance between price, performance and stability of the cavity optics. In particular, a number of optical components critically affect laser operating and output characteristics, and their specifications must therefore be properly understood and managed. We will discuss the most important of these, specifically for DPSS lasers operating at their fundamental wavelength, and in which ones damage due to high peak powers is not a significant concern.
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How Wedge and Decenter Affect Aspheric Optics
Driven by the ever-increasing resolution and field size of focal plane arrays as well as the need for smaller, lighter-weight systems and lower manufacturing costs, aspheric lens elements are now ubiquitous in nearly every market from aerospace to consumer electronics. For years, manufacturing advances have focused on techniques and tools to improve surface figures, but many designers and system integrators now understand that the relationship between front-side and back-side geometries can be just as important, especially in controlling off-axis aberrations.
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GDD Measurements Boost Ultrafast Laser Performance
“Dude, where’s my pulse width?!” Anybody working with an ultrafast laser has probably uttered these (or similar) words at some point. Symptoms of pulse width problems can come in the form of lower conversion efficiencies, fainter microscope images or lower signal-to-noise ratio (SNR) for a given experiment. Easy group delay dispersion measurements improve results in applications such as laser amplifiers, optical coatings, harmonic generation, bioimaging and microscopy.
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MicroLED Sources Enable Diverse Ultralow-Power Applications
A brush with the second law of thermodynamics can increase a product’s on-shelf appeal – and more. The drive toward LED-based lighting has resulted in the development of devices with ever-increasing light output and color performance. The lumen-per-dollar total is now the figure of merit often used to judge competing LEDs. To enable market uptake, the focus has shifted from efficiency to cost. However, other applications based on LEDs are striving for smaller sizes and more efficient solutions – such as thinner screens or more portable detection systems.
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Cary 7000 UMS
Agilent Technologies
See what you've been missing with the NEW Agilent Cary 7000 UMS. Agilent introduces a revolution in solid sample measurement – the Cary 7000 Universal Measurement Spectrophotometer (UMS).
More info >>
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CODE V 10.6
Optical Design Software
Synopsys, Inc.,
Optical Solutions Group
CODE V® Optical Design Software version 10.6 further enhances its industry-leading design optimization capabilities with an innovative new optimization feature to speed the design of advanced optical systems.
More info >>
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Safety Eyewear
Iridian Spectral Technologies
Iridian Spectral Technologies Ltd.’s LaseReflect LRG10 glasses mitigate the effects of laser pointers, which can cause dangerous distractions or even temporary blindness for airline pilots, train conductors, law enforcement personnel and others.
More info >>
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Pyroelectric Energy Sensors
Ophir-Spiricon LLC, Photonics
Models PE50BB-DIF-C and PE50-DIF-ER-C pyroelectric pulsed laser sensors from Ophir Photonics, a Newport Corp. brand, complete its PE-C line.
More info >>
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