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electron-beam lithography system
An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer...
epitaxial equipment
Epitaxial equipment refers to a set of specialized tools and systems used in the process of epitaxy, which is the growth of crystalline layers on a substrate material. Epitaxial growth is a critical...
gallium arsenide
Gallium arsenide (GaAs) is a compound semiconductor material composed of gallium (Ga) and arsenic (As). It belongs to the III-V group of semiconductors and has a zincblende crystal structure. GaAs is...
lithography
Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of...
photolithography
Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer...
photomask
A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision...
photoresist
Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS)....
spin coating
Spin coating is a widely used technique in the fabrication of thin films and coatings, particularly in microelectronics, optoelectronics, and nanotechnology. It involves depositing a liquid precursor...
wafer
In the context of electronics and semiconductor manufacturing, a wafer refers to a thin, flat disk or substrate made of a semiconducting material, usually crystalline silicon. Wafers serve as the...
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