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8 terms
Photonics Dictionary
Clear All Filters x
plasma deposition x
chemical vapor deposition equipment
Chemical vapor deposition (CVD) equipment refers to a class of specialized apparatus used in the process of chemical vapor deposition, a technique for depositing thin films of various materials onto...
magnetic enhancement
Plasma-enriched deposition or planar magnetic sputtering that offers increased deposition rates in optical thin-film production. This technology surpasses conventional and RF sputtering.
magnetron sputtering
A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the...
PCVD
plasma chemical vapor deposition
physical vapor deposition
->
magnetron sputtering
A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the...
plasma chemical vapor deposition
The use of a plasma to induce the formation of oxides in the production of graded-index optical fibers.
sputtering equipment
Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface...
sputtering target
A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds...
Photonics Dictionary
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