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photoresist
Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS)....
lithography
Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of...
masks for evaporation/deposition
In the context of thin film deposition processes such as evaporation or sputtering, masks are used to selectively deposit material onto substrates, creating patterns or structures with precise...
microcircuit manufacturing
The formation of transistors, diodes, capacitors, resistors and other electronic elements directly on a flake of silicon by etching and selective absorption of doping elements. A circuit diagram...
near-field holography
A lithography method that allows the transfer of fine-pitch gratings from a phase mask into photoresist. The exposure takes place with the light coming under an oblique angle to the mask. The...
photolithography
Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer...
photomask
A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision...
simultaneous exposure and development
The process, used with a positive photoresist, in which the photoresist is immersed in developing chemicals while being exposed to the optical pattern. The newly exposed surface is continuously...
spin coating
Spin coating is a widely used technique in the fabrication of thin films and coatings, particularly in microelectronics, optoelectronics, and nanotechnology. It involves depositing a liquid precursor...
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