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Sputtering Equipment
Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface by bombarding a target material with high-energy ions or atoms. This bombardment dislodges atoms from the target material, which then travel through a vacuum chamber and deposit onto the surface of the substrate, forming a thin film.
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Glossary
sputtering
A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.
cold sputtering
The application of coating without heating of the substrates.
cathode sputtering
The method of disintegrating the substance of the cathode by bombarding it with ions and depositing it on another electrode or electron tube envelope.
magnetron sputtering
A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the target in order to intensify the bombardment of ions...
planar magnetron
A device used in the sputtering of thin films, in which a magnet system on the back of the cathode deflects the electrons, lengthening the ionization path. The accelerated ions transfer their momentum to particles of the coating material, which are...
vacuum apparatus
Equipment dependent on the effects of a vacuum. The principal applications in optics are in the coating of lenses and substrates and the fabrication of multilayer interference filters.
sputtering equipment
Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface by bombarding a target material with high-energy...
Sputtering Equipment Suppliers
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