Manufactures ion beam etch/deposition (IBE/IBD) systems for a wide range of optical thin-film fabrication and EUV mask blanks applications. Also makes MOCVD, MBE, ALD, lithography, laser spike annealing/melt, single-wafer etch/clean, and 3D inspection systems for photonics, optics, power electronics, and advanced semiconductor devices.
Established: 1984
Employees: 1000
Facility area (sq ft): 60,000
Ownership type: Publicly Traded Stock