Antireflection nanotextures etched directly into the bulk optical material providing high optical performance with R down to 0.01%; extreme broadband performance UV-NIR, no added absorption, high laser damage threshold. Available in fused silica, diamond, sapphire, and a wide range of IR materials.
Established: 2000
Employees: 11
Facility area (sq ft): 2500
Ownership type: Privately Owned